Sales Manager: Mr. Peng
Tel: +86 136 0112 5769
E-mail:sales@technol.cn
Feature: This equipment adopts hot filament chemical vapor deposition
technology, has been used in many domestic hot filament production of
diamond production lines. The device has produced the large size flake
polycrystalline diamond thick film, filled the domestic blank, and
received a very considerable economic benefits. This series of equipment
is suitable for industrial production, scientific research, teaching
and product pilot use.
Main Function: For the growth of millimeter-grade diamond thick film, diamond film, diamond-like film, silicon nitride and silicon oxide film, etc. On the cutting tools, drill bits, taps and other material surfaces deposit diamond film.
Application: Suitable for all units of laboratories, colleges and universities laboratories, teaching and other projects of scientific research, product pilot use.
Technical Parameters
Equipment Name | Hot Filament HFCVD Equipment |
Model | HF600 |
Chamber Structure | Vertical front door structure, rear pumping system, double-layer water cooling |
Chamber Size | Φ600×H500mm |
Substrate Holder Size | Φ200mm |
Substrate Temperature | 600~1100℃(1112~2012℉) |
Power Supply | DC |
Control Method | PLC Control/IPC automatic control(optional) |
Occupied Area | (Mainframe) L1700×W1080×H1900mm |
Power | ≥50kW |