Feature: This equipment adopts the organic metal source of chemical vapor deposition technology, clean and non-pollution quartz tube growth chamber, 4-6 routes of  reasonable gas flow control, accurate and uniform temperature control, high heating temperature and can up to 1000 ℃, combined with high-vacuum environment and vacuum annealing furnace function.

Main Function: Can be used to preparation of optoelectronics, semiconductors, graphene, microwave devices and other high-purity films.

Application: Suitable for all units of laboratories, colleges and universities laboratories, teaching and other projects of scientific research, product pilot use.

Technical Parameters