General Manager: Mr. Shi
Mobile: +86 185 1019 5926
Sales Manager: Mr. Zhu
Mobile: +86 136 0112 3129
Technical Support: Mr. Lee
Mobile: +86 136 0112 5769
This equipment adopts hot filament chemical vapor deposition technology, and it has been used in many domestic hot filament production of diamond production lines. The device has produced the large size flake polycrystalline diamond thick film, filled the domestic blank, and received a very considerable economic benefits. This series of equipment is suitable for industrial production, scientific research, teaching and product pilot use.
For the growth of millimeter-grade diamond thick film, diamond film, diamond-like film, silicon nitride and silicon oxide film, etc.. On the cutting tools, drill bits, taps and other material surfaces deposit diamond film.
|Equipment Name||HFCVD (Hot Filament Assisted CVD) System|
|Chamber Structure||Vertical front door structure, rear pumping system, double-layer water cooling|
|Substrate Holder Size||Φ200mm|
|Substrate Temperature||600~1100℃ (1112~2012℉)|
|Control Method||PLC Control / IPC automatic control (optional)|
|Occupied Area||(Mainframe) L1700×W1080×H1900mm|
Application: Suitable for all units of laboratories, colleges and universities laboratories, teaching and other projects of scientific research, product pilot use.